A series of images of a AMI/RIT resolution mask was imaged at the following partial coherence values: 0.7, 0.65, 0.6, 0.55, 0.5, 0.45, 0.4, and 0.35. The line-width and slope of the 10 micron lines imaged at each particular partial coherence value was analyzed and evaluated. The slope of the developed photoresist sidewall improved significantly with a decrease in partial coherent illumination, except for the 0.7 to 0.65, range while the line-width decreased.
Imaging Science (BS)
Department, Program, or Center
School of Photographic Arts and Sciences (CIAS)
Watso, Robert Douglas, "The effects of partial coherence on the imaging of lines on photoresist" (1985). Thesis. Rochester Institute of Technology. Accessed from
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