A survey of optical properties of sputtered materials in the spectral range of 145 nm to 800 nm has been performed. The optical constants n and k have been measured using ellipsometric techniques. Four combination materials have been created with the properties suitable for application in Attenuated Phase Shift Mask (APSM) manufacturing. The four combination materials have also been characterized, with the results presented.
Library of Congress Subject Headings
Small business--Environmental aspects; Production management--Environmental aspects; Business enterprises--Environmental aspects; ISO 14001 Standard
Department, Program, or Center
Microelectronic Engineering (KGCOE)
Bruce W. Smith
Bourov, Anatoly, "Optical properties of materials for 157 nm lithography" (2003). Thesis. Rochester Institute of Technology. Accessed from
RIT – Main Campus