A study was conducted in which a series ofexperiments were performed using three positive photoresists and three developers in crossed experimentation, simulating semiconductor fabrication steps. Tests conducted, examined coating uniformity, unexposed resist loss, photosensitivity, undercut, and resist flow. Although there was not a clear-cut optimum resist/developer pair, some worked better than others.
Library of Congress Subject Headings
Imaging Science (BS)
Department, Program, or Center
School of Photographic Arts and Sciences (CIAS)
Mary Ann Hellawell
Maltabes, John G., "Optimization of positive resist/developer pairs for semiconductor fabrication" (1982). Thesis. Rochester Institute of Technology. Accessed from
RIT – Main Campus