Abstract

A study was conducted in which a series ofexperiments were performed using three positive photoresists and three developers in crossed experimentation, simulating semiconductor fabrication steps. Tests conducted, examined coating uniformity, unexposed resist loss, photosensitivity, undercut, and resist flow. Although there was not a clear-cut optimum resist/developer pair, some worked better than others.

Library of Congress Subject Headings

Photoresists; Photolithography

Publication Date

4-24-1982

Document Type

Thesis

Student Type

Undergraduate

Degree Name

Imaging Science (BS)

Department, Program, or Center

School of Photographic Arts and Sciences (CIAS)

Advisor

Mary Ann Hellawell

Comments

Physical copy available from RIT's Wallace Library at TK8331.M34 1982

Campus

RIT – Main Campus

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