A linewidth measurement system has been developed which incorporates a coherent laser microspot with a piezo flexure-pivot translational stage. A line is scanned beneath the microspot and reflected energy collected with an on axis geometry normal to the wafer. Position versus reflectance data are presented for lines patterned in thick and thin oxide films on I.e. wafers.
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School of Photographic Arts and Sciences (CIAS)
Pomerene, Andrew, "Coherent optical linewidth measurement of thick films on integrated circuit wafers" (1981). Thesis. Rochester Institute of Technology. Accessed from
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