A Perkin-Elmer Micralign 230 Exposure Tool was used in an analysis of magnification variation. In the analvsis, all elements were kept constant except for the repositioning of the mask between sets of wafers that were exposed. Repositioning was initiated by removal and replacement of the mask from the exposure tool and the mask holder. Overlay measurements were then taken from the exposed wafers. These measurements were used to calculate the amount of magnification error of the images found on the wafers. These magnification values verified the hypothesis that repositioning of the mask has a significant effect on magnification values.
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School of Photographic Arts and Sciences (CIAS)
Dolan, Sarah M., "Variations in image magnification due to mask repositioning in a 1:1 projection printer" (1983). Thesis. Rochester Institute of Technology. Accessed from
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