Experiments were performed on the deposition of both diamond crystals and films from hydrogen and methane gas mixtures on silicon and polymer substrates by various plasma enhanced chemical vapor deposition techniques (PECVD) . Microwave, arc, and dc plasmas to assist the deposition of the diamond metastable phase of carbon were used. Discussed in the following thesis are the plasma configurations used together with experimental parameters such as gas composition, flow rate, chamber pressure, and power. The crystallinity of the films, which can be controlled and changed from polycrystalline to amorphous, was ascertained by scanning electron microscopy (SEM) . Other characterization techniques employed were profilometry to indicate uniformity, depth profiles and growth rates, and Raman spectroscopy which depicted chemical structure.
Library of Congress Subject Headings
Diamonds, Artificial; Diamond thin films; Plasma-enhanced chemical vapor deposition
Department, Program, or Center
School of Chemistry and Materials Science (COS)
Freeman, Mathieu Jon, "Synthesis diamond films from low pressure chemical vapor deposition" (1990). Thesis. Rochester Institute of Technology. Accessed from
RIT – Main Campus
Note: imported from RIT’s Digital Media Library running on DSpace to RIT Scholar Works in December 2013. Physical copy available through RIT's The Wallace Library at: TP873.5.D5 F73 1990