This thesis is to study the four main factors which affect cell depth in copper cylinder etching in direct transfer gravure, and using ferric chloride as an etchant. The multivariate regression method was used to analyze the sample responses (cell depth) of nine different treatments of an etched-screened-tone scale . The regression equations for predicting cell depths from the four variable factors were calculated and the optimum condition which would give the best tonal gradation was predicted. Also the factors which cause uneven cell depth were detected.
Library of Congress Subject Headings
Department, Program, or Center
School of Print Media (CIAS)
Sringkarrinkul, Somchai, "The study of factors that affect cell depth during etching in direct transfer gravure" (1981). Thesis. Rochester Institute of Technology. Accessed from
RIT – Main Campus