Abstract
DC arc plasmas containing He and Ar, which were made to rotate by the application of a magnetic field, were used for generating vacuum UV light (VUV) to modify polymer surfaces. Polymers such as poly(tetrafluoroethylene) (PTFE), fluorinated ethylene propylene copolymer (FEP), polyimide (PI), UPDLEX-S and UPILEX-R were modified with and without optical filters for different exposure times. PTFE was also exposed to helium and argon arc plasmas at different exposure temperatures. After the treatment, the polymerfilms were measured by weight loss, contact angle and Scanning Electron Microscopy (SEM). Copper was sputter deposited onto some of the treated samples and the adhesion between copper and polymer film was measured using a peel test.
Library of Congress Subject Headings
Polymers--Effect of radiation on; Polymers--Surfaces; Ultraviolet radiation; Plasma (Ionized gases)
Publication Date
11-1-1990
Document Type
Thesis
Department, Program, or Center
Center for Materials Science and Engineering
Advisor
Vukanovic, V.
Advisor/Committee Member
Takacs, G.
Advisor/Committee Member
Clark, R.
Recommended Citation
Chen, Jian-Xin, "Modification of organic polymers with vacuum ultraviolet radiation from inert gas plasmas rotating in a magnetic field" (1990). Thesis. Rochester Institute of Technology. Accessed from
https://repository.rit.edu/theses/2783
Campus
RIT – Main Campus
Comments
Note: imported from RIT’s Digital Media Library running on DSpace to RIT Scholar Works. Physical copy available through RIT's The Wallace Library at: QD381.9.R3 C486 1990