Abstract

Interdigitated back contact solar cells were fabricated by a process in which patterned photoresist is jet printed directly on the wafer instead of by lithography. The patterned photoresist is used as a barrier for phosphorous and boron implantation as well as for contacts and metal etching. Control solar cells were fabricated by lithography in order to compare the performance of each patterning method. It was found that some of the jet printed photoresist films had non-uniformity issues with respect to the minimal thickness required for implant masking. When these thin zones are not present, structures obtained by jet printed are very similar to those obtained by lithography. With appropriate manufacturing development this technology has been shown to be feasible for lower-cost high volume production of solar cells.

Library of Congress Subject Headings

Solar cells--Design and construction; Photovoltaic cells--Design and construction; Semiconductors--Design and construction

Publication Date

6-29-2012

Document Type

Thesis

Department, Program, or Center

Electrical Engineering (KGCOE)

Advisor

Pearson, Robert

Comments

Note: imported from RIT’s Digital Media Library running on DSpace to RIT Scholar Works. Physical copy available through RIT's The Wallace Library at: TK2960 .A58 2012

Campus

RIT – Main Campus

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