Alumina (Al2O3) thin films are used in anti-reflection and high reflection mirror coatings from deep UV to near infrared. The optical, mechanical, and structural properties of films are dependent on the deposition technique and the desired film performance can be achieved by manipulating the deposition parameters. Such deposition parameters are substrate temperature, deposition rate, and oxygen partial pressure. For laser mirror performance applications, it is desirable to optimize the films with regards to laser damage threshold and film stress. To these ends, this thesis work studies Al2O3 thin films synthesized with electron beam evaporation technique as a function of oxygen partial pressure. As the oxygen partial pressure increases the laser damage resistance improves with the film absorption in UV region. At the same time, the residual stress is observed to shift towards less tensile stress, likely due to water absorption. Additionally, the study included the optical performance of Al2O3 monolayer films, showing the refractive index decreases with increasing oxygen pressure.
Materials Science and Engineering (MS)
Department, Program, or Center
School of Chemistry and Materials Science (COS)
Teklemarim, Tsion, "The Influence of Oxygen Partial Pressure on the Properties of Evaporated Alumina Thin Film" (2021). Thesis. Rochester Institute of Technology. Accessed from
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