A software system for preparing data for e-beam mask making called Computer Aided Transcription Software is described. In order to appreciate its capabilities, an overview of writing requirements for a MEBES I e-beam tool are given. Sample files and software output are provided to illustrate the concepts.
Fink, Ian David
"Integration of CAD Data Transcription for E-Beam Lithography,"
Journal of the Microelectronic Engineering Conference: Vol. 5
, Article 7.
Available at: https://scholarworks.rit.edu/ritamec/vol5/iss1/7