This project investigated the concept of a chromeless phase-shifting mask. An optical simulator, SPLAT, was used to predict the aerial image formed for various chromeless phaseshifting patterns. Allied Signal 311 spin on glass was patterned on a quartz plate and imaged using a GCA MANN4800, lOX, NA=O.28, G-line stepper to demonstrate the concept. Simulations showed and experimental results confirmed that a dark field could be produced with checkerboard patterns below 0.4Lambda/NA. Using 25% solid KT1820 resist coated at a thickness of 5000A, 0.6um lines and spaces were resolved.
Yue, Kuen C.
"Fabrication of Chromeless Phase-Shifting Mask Using Spin on Glass,"
Journal of the Microelectronic Engineering Conference: Vol. 5:
1, Article 31.
Available at: https://scholarworks.rit.edu/ritamec/vol5/iss1/31