Publication Date
1991
Document Type
Paper
Abstract
PROLITH/2, a tool for modelling and analyzing photolithographic processes, was used to explore two statistically designed experiments. The first was the aerial image formation and the second was resist development process. Results are presented to illustrate the software capability.
Recommended Citation
Shiao, Wai-Man Wilma
(1991)
"Studies of Optical Lithographic Process With the Aid of Prolith/2,"
Journal of the Microelectronic Engineering Conference: Vol. 5:
Iss.
1, Article 21.
Available at:
https://repository.rit.edu/ritamec/vol5/iss1/21