Publication Date
1990
Document Type
Paper
Abstract
ALTILITH CEM-420WS water soluble contrast enhancement material was used to improve lithographic capabilities of KTI-820 positive photoresist when imaged with a GCA/Mann 4800 DSW g-line 0.28NA Stepper. Improvements in photoresist edge profiles of a two micron line/space pattern were observed using a scanning electron microscope. Experimental data indicated a three fold improvement in V contrast and a significant increase in exposure latitude. The experimental results are contrasted with simulated results using PROLITH photoresist modeling software.
Recommended Citation
DeMuynck, David A.
(1990)
"The Use of a Water Contrast Enhancement Material for Lithographic Improvement,"
Journal of the Microelectronic Engineering Conference: Vol. 4:
Iss.
1, Article 11.
Available at:
https://repository.rit.edu/ritamec/vol4/iss1/11