Publication Date
5-8-2017
Document Type
Poster
Recommended Citation
Omar, Salwan
(2017)
"Process Development of Sidewall Spacer Features for sub-300nm Dense Silicon FinFETs,"
Journal of the Microelectronic Engineering Conference: Vol. 23:
Iss.
1, Article 25.
Available at:
https://repository.rit.edu/ritamec/vol23/iss1/25