In order to confidently reproduce results obtained from experimentation or standard processing, the stability of the involved equipment’s performance must be understood. Therefore, it is important to monitor, on a regular basis, the outputs of an equipment set which are delivering a desired process. In this paper, a qualification test or "qual” will be defined for RIT’s 150mm i-line photolithography process which utilizes a Canon FPA 2000-i1 exposure tool.
Perez, Joseph G.
"I-Line Resist Process Monitor,"
Journal of the Microelectronic Engineering Conference: Vol. 11
, Article 2.
Available at: https://scholarworks.rit.edu/ritamec/vol11/iss1/2