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Evaluation of Source Geometry Using a Pinhole Camera
Marilyn Maloney

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I-Line Resist Process Monitor
Joseph G. Perez

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Development of Automated Alignment Methodology on the Canon I-Line Stepper
Domenico DiPaola

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Utilization of the Hitachi S-6780 SEM For Critical Dimension Measurement
Timothy Footer

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Optical Emission Spectroscopy for Plasma Etch Endpoint Detection
Keith R. Miller

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Cross Sectional Analysis of IC Devices Using Polishing techniques and SEM Imaging
Peter G. Terrana

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Incorporation of Control charts into a Manufacturing Execution System
Charles J. Gruener

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Dry Etch of Shadow Trench Isolation
Patrick W. Reece

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CMP Process Development for Shallow Trench Isolation (STI)
Robert A. Selfridge

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Polysilicon-Germanium Films Fabricated by Ge Sputtering
Jose L. Medina

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The Effect of Fluorine on Low Temperature Boron Activation in Ultra Shallow Junctions
Jeremy J. Kempisty

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Development of CoSi2 Salicide Process
Oleg A. Kirillov

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Electrolytic Plating of Copper
Keith M. Udut

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Carbon Nanotubes: CVD Reactor Deign and Growth of Multi-Walled Carbon Nanotubes
Jun S. Hyun

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Ohmic Contact Formation on N-Type 6H-SiC Using Poly-Si and Silicides
Asuka E. Nomura

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Fabrication and Characterization of 6H-SiC Photovoltaic Devices
Russell P. Ott

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Design and Fabrication of On-Chip Inductors
Robert K. Requa

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Full-Wafer DMOS Fabrication at RIT
Stephen Sudirgo and Alex Pamatat

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Reflection Transmission Modulator
Ti'ona I. McCauley

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Design and Analysis of a CMOS Based MEMS Accelerometer
Matthew A. Zeleznik

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Characterization of SU-8 5 for MEMS Applications
Sean Corcoran