The procedures to create hardcopies of designs created on General Electric's CALMA, Computer Aided Design system is discussed. Also addressed is the interfacing of the CALMA to a Mann 3000 Pattern Generator.
Marshall, Glenn A.
"Mask and Plot Generation on the Calma,"
Journal of the Microelectronic Engineering Conference: Vol. 1
, Article 19.
Available at: https://scholarworks.rit.edu/ritamec/vol1/iss1/19