Description
The use of statistically designed experiments provide an efficient method of investigating a lithographic process. Lithographic simulators have also been used as a tool in the investigation of these processes. This paper provides a general methodology for conducting designed experiments in which a computer simulator is the tool used as the data collection device. The rim shifter is a phase shifting technique that was investigated. Response surfaces measuring depth of focus were generated from simulated data. The resolution and depth of focus capabilities of this phase shift technique were also measured by both experimental and simulated data.
Date of creation, presentation, or exhibit
8-8-1993
Document Type
Conference Paper
Department, Program, or Center
Microelectronic Engineering (KGCOE)
Recommended Citation
Richard D. Holscher, Bruce W. Smith, Steve K. Brainerd, "Response surface modeling of rim phase-shift masks", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); doi: 10.1117/12.150483; https://doi.org/10.1117/12.150483
Campus
RIT – Main Campus
Comments
Copyright 1993 Society of Photo-Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
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