Location

Rochester Institute of Technology

Start Date

5-2015 12:00 AM

End Date

5-2015 12:00 AM

Description

Goal: Modify carbon hard mask to minimize reflectivity and enable line-width trimming.

  • Work in conjunction with Master’s thesis work to create an ideal carbon hard mask layer.
  • Determine necessary PECVD parameters for processing

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May 1st, 12:00 AM May 1st, 12:00 AM

Carbon Hard Mask for Line Width Trimming

Rochester Institute of Technology

Goal: Modify carbon hard mask to minimize reflectivity and enable line-width trimming.

  • Work in conjunction with Master’s thesis work to create an ideal carbon hard mask layer.
  • Determine necessary PECVD parameters for processing