The effects of partial coherence on the imaging of lines on photoresist

Author

Robert Douglas Watso

Abstract

A series of images of a AMI/RIT resolution mask was imaged at the following partial coherence values: 0.7, 0.65, 0.6, 0.55, 0.5, 0.45, 0.4, and 0.35. The line-width and slope of the 10 micron lines imaged at each particular partial coherence value was analyzed and evaluated. The slope of the developed photoresist sidewall improved significantly with a decrease in partial coherent illumination, except for the 0.7 to 0.65, range while the line-width decreased.

Publication Date

4-16-1985

Document Type

Thesis

Student Type

Undergraduate

Degree Name

Imaging Science (BS)

Department, Program, or Center

School of Photographic Arts and Sciences (CIAS)

Advisor

Name Illegible

Comments

Physical copy available from RIT's Wallace Library at TK7874.W39 1985

Recommended Citation

Watso, Robert Douglas, "The effects of partial coherence on the imaging of lines on photoresist" (1985). Thesis. Rochester Institute of Technology. Accessed from
https://repository.rit.edu/theses/880

Campus

RIT – Main Campus