Abstract

A mathematical model of the Nikon Lampas Reflection Measuring Microscope for the fine-line lithography in integrated circuit manufacture has been developed. Optical intensity profiles of a perfect line were computed using computer software supplied by the National Bureau of Standards. The programs were modified for the Lampas microscope. From line profiles, the accuracy of the microscope was calculated. The microscope is accurate down to 6/10 of a micron. All lines below 6/10 of a micron were unresolved.

Publication Date

1985

Document Type

Thesis

Student Type

Undergraduate

Degree Name

Photographic and Imaging Technology (BS)

Department, Program, or Center

School of Photographic Arts and Sciences (CIAS)

Advisor

Diana Nyyssonen

Campus

RIT – Main Campus

Share

COinS