Abstract
None provided.
Library of Congress Subject Headings
Plasma etching; Plasma chemistry--Industrial applications; Semiconductors--Etching
Publication Date
9-1-1987
Document Type
Thesis
Department, Program, or Center
School of Chemistry and Materials Science (COS)
Advisor
Vukanovic, Vladimir
Recommended Citation
Fagan, James G., "Reactive ion etching of polyimide films using a radio frequency discharge" (1987). Thesis. Rochester Institute of Technology. Accessed from
https://repository.rit.edu/theses/6039
Campus
RIT – Main Campus
COinS
Comments
Note: imported from RIT’s Digital Media Library running on DSpace to RIT Scholar Works. Physical copy available through RIT's The Wallace Library at: TP156.P5 F563 1987