Photolithography model parameter extraction from in-situ measured development rates

Author

Patrick G. Drennan

Abstract

None provided.

Library of Congress Subject Headings

Microlithography--Computer simulation; Photolithography--Computer simulation; Photoresists--Design and construction--Computer simulation; Integrated circuits--Design and construction

Publication Date

9-1-1993

Document Type

Thesis

Department, Program, or Center

Electrical Engineering (KGCOE)

Advisor

Smith, B.

Comments

Note: imported from RIT’s Digital Media Library running on DSpace to RIT Scholar Works. Physical copy available through RIT's The Wallace Library at: TK7874.D73 1993

Recommended Citation

Drennan, Patrick G., "Photolithography model parameter extraction from in-situ measured development rates" (1993). Thesis. Rochester Institute of Technology. Accessed from
https://repository.rit.edu/theses/5634

Campus

RIT – Main Campus