Using edge gradient analysis on chrome and emulsion photomasks to determine the modulation transfer function of a mask making system proved to be limited by the method in which the edge gradients were observed. Scanning electron micrographs were taken of the chrome and emulsion edges on various masks, and results showed that chrome photosmasks exhibit steeper gradients and better edge acuity than emulsion images. However, due to the ratio of line size to gradient size on each of the types of masks, it was decided that the gradient would not make a significant contribution to modulation loss in the image.
Library of Congress Subject Headings
Integrated circuits--Masks--Analysis; Optical transfer function; Masks (Electronics)
Department, Program, or Center
School of Photographic Arts and Sciences (CIAS)
Levin, Marcy E., "The use of edge gradient analysis on chrome and emulsion photomasks to determine modulation transfer functions" (1985). Thesis. Rochester Institute of Technology. Accessed from
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