The spectral sensitivity of KODAK Micro Positive Resist 820 has been determined for the spectral range of 300nm to 500nm. A xenon-source monochrometer was used in a hard contact exposing system. Se/isitivity is defined as the inverse of the exposure (mj/cm ) needed to produce an image in a photoresist coated plate having walls of 70 normal slope. Low intensity reciprocity law failure has been conclusively shown to exist in this resist with exposure intensities of 100 mw/cm and below. Guide lines have been drawn up, based on the procedures and results of the experimentation, to assist photoresist users in determining the spectral sensitivity of a photoresist. The feasibility of these procedures has been determined to be positive.
Library of Congress Subject Headings
Semiconductors; Photoresists; Microelectronics
Department, Program, or Center
School of Photographic Arts and Sciences (CIAS)
Huck, Matthew L., "Determining spectral sensitivity of Kodak Micro Positive Resist 820" (1983). Thesis. Rochester Institute of Technology. Accessed from
RIT – Main Campus