An attempt was made to obtain a set of spatial transfer functions which would allow the prediction of output effective exposure distributions for a nonlinear lithographic film system. Slit exposures were used as one-dimensional system inputs. It was proposed that the use of slits would allow the calculation of a general system transfer function to be simplified. The mathematical model chosen to describe this nonlinear transfer was shown to be invalid due to the nonlinear relationship of small area system gain (small area output effective exposure divided by the input exposure) as a function on input exposure. The model,, based on a condensation of the multidimensional MacLaurin series, required this relationship to be linear. Data obtained from the small area effective exposure distributions allowed the calculation of a small area semi-specular density vs. relative log exposure curve. There existed a dramatic reduction in contrast for the small area curve as compared with the large area characteristics of the lithographic film system.
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School of Photographic Arts and Sciences (CIAS)
Holbrook, David S., "An investigation of a mathematical model to characterize the nonlinear nature of a lithographic film system" (1981). Thesis. Rochester Institute of Technology. Accessed from
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