A normal binary chrome mask is designed with optical proximity correction features to test their effect on the lithographic image formed. A significant image improvement is seen due to the addition of the OPC features.
"Design and Characterization of an Optical Proximity Correction (OPC) Mask,"
Journal of the Microelectronic Engineering Conference: Vol. 7
, Article 17.
Available at: http://scholarworks.rit.edu/ritamec/vol7/iss1/17