Publication Date
1997
Document Type
Paper
Abstract
A normal binary chrome mask is designed with optical proximity correction features to test their effect on the lithographic image formed. A significant image improvement is seen due to the addition of the OPC features.
Recommended Citation
Varma, Sumir
(1997)
"Design and Characterization of an Optical Proximity Correction (OPC) Mask,"
Journal of the Microelectronic Engineering Conference: Vol. 7:
Iss.
1, Article 17.
Available at:
https://repository.rit.edu/ritamec/vol7/iss1/17