A methodology was arrived at for the design of an inorganic bottom antireflective coating (BARC). The design methodology consisted of four parts. First, a material compatible with IC processing was chosen. Second, simulation was performed to determine the optimum optical properties of the material, where the materials extinction coefficient, and film thickness were varied to produce zero substrate reflectivity. Third, the stochiometry of the material was varied through experimentation to produce a film with the index of refraction and extinction coefficient as close as possible to the simulation results. Fourth, the results of step three were used in simulation to re-determine the film thickness required to produce zero reflectivity at the substrate. The methodology was implemented and a SixNy BARC was designed for RIT’s G-Line (436nm) process. The applicability of the design method to any exposure wavelength is demonstrated by designing an I-Line BARC concurrently. The film conformality of organic and inorganic BARCs were compared.
"The Design of an Inorganic BARC,"
Journal of the Microelectronic Engineering Conference: Vol. 7
, Article 15.
Available at: http://scholarworks.rit.edu/ritamec/vol7/iss1/15