The study done was to develop strategies that utilize the measurement and analytical capabilities of a Semitest Surface Charge Analyzer (SCA 2000) and monitor contamination caused during certain processes and in furnaces in an IC fab. A significant drop in average minority carrier lifetime and an increase in fixed oxide charge was observed. Counterdoping was also observed in one of the furnaces.
"Development of Process Monitoring Monitoring Strategies for Contamination Control Utilizing a Surface Charge Analyzer,"
Journal of the Microelectronic Engineering Conference: Vol. 7
, Article 12.
Available at: http://scholarworks.rit.edu/ritamec/vol7/iss1/12