Characterization of a MEBES I electron beam lithography tool was done to investigate electron bear writing errors induced by electrical and mechanical interactions of the system. Process development of SAL6O3 a negatively working chemically amplified resist, which is required to provide a high sensitivity repeatable resist film, was also done.
Holscher, Richard D.
"Characterization and Process Development for the MEBES I Electron Beam Lithography System,"
Journal of the Microelectronic Engineering Conference: Vol. 5
, Article 9.
Available at: http://scholarworks.rit.edu/ritamec/vol5/iss1/9