Local stress field determination by means of free standing structures was investigated. The process for manufacturing these structures was developed and used to study the stress in polysilicon films.. For a 1.5um polysilicon film, the stress was determined to be less than 6.77e8Dynes/cm2. For a 0.5um polysilicon films, the stress was found to be 4. O9e8Dynes/cm2.
"Local Stress Field Determination for Thin Polysilicon Films,"
Journal of the Microelectronic Engineering Conference: Vol. 5
, Article 15.
Available at: http://scholarworks.rit.edu/ritamec/vol5/iss1/15