Fully Recessed Oxide Isolation Technology (FROIT) and LOCOS methods were both fabricated to verify if the FROIT process provides solutions to two major problems associated with LOCOS, namely the bird’s beak formation and surface topography. The FROIT process uses a two step field oxidation and employs a nitride sidewall to recess the oxide and reduce the bird's beak, respectively. The SEM results verified the FROIT process achieved the desired results.
Jones, Ronald G. Jr
"Fully Recessed Oxide Isolation Technology for NMOS Fabrication,"
Journal of the Microelectronic Engineering Conference: Vol. 5
, Article 11.
Available at: http://scholarworks.rit.edu/ritamec/vol5/iss1/11