Microelectronic Engineering Conference 1991
Papers
Multilevel Metalization
Michael J. Bailey
A Comparison Between Resist Hardening Using a Conformable Mold and Plasma Resist Image Stabilization: Techniques to Enhance Resist Thermal Stability
Kathleen M. Brown
Design of a 4-Bit Microprocessor
Hsiao-Hui Miguel Chen
Design and Fabrication of Five Microns NMOS SRAM
Robert Chizmadia
an Ellipsometeric Evaluation of Ion Implanted Silicon
Patrick G. Drennan
A DRM Study of Microposit SAL603 Resist in Developers of Different Normality
Kimberly A. Guggemos
Characterization and Process Development for the MEBES I Electron Beam Lithography System
Richard D. Holscher
Evaluation of a Double Resist Process
Joseph Jech Jr
Fully Recessed Oxide Isolation Technology for NMOS Fabrication
Ronald G. Jones Jr
Local Stress Field Determination for Thin Polysilicon Films
Pirouz Maghsoudnia
Fabrication of Micromechanical Devices: Pin Joints, Sliders, Springs, and Micromotors
Matthew P. Matessa
Solar Cell Design Employing a Textured Surface
Diane M. Mauersberg
BiCMOS vs CMOS at RIT
Anatole Raif
Linear Poly Gate Charge Coupled Device Imaging Arrays
Lucien Randazzese
Studies of Optical Lithographic Process With the Aid of Prolith/2
Wai-Man Wilma Shiao
Polysilicon Emitter Bipolar Transistors
Todd C. Sieger
Characterization, Optimization, and Qualification of Shipley 812 Photoresist for Wafertrac Processing
David H. Taylor
Ferroelectric Thin Film Research at RIT
John P. Verostek
Characterization of Chemically Amplified Advanced Negative Resist for G Line Application
Shu Tsai Wang
Design and Fabrication of a Lateral Bipolar PNP Transistor Compatible with RIT's Double Diffused Process
James A. Will II
Low Temperature Deposition of Si02 Films by ECR
Merle D. Yoder Jr