Two Anti-reflective coatings (ARC), ARC-XL end ARC-PN2, were studied f or process latitude. Temperature bake and exposure dose were varied and their effect on 5.Oum line/space pairs was evaluated. Using the software package RS1 a full factorial experiment with centerpoints was designed. The two ARCs used, did reduce notching and the manufacturer’s processing ranges were verified. However, to establish the process latitude a wider range of exposure doses needs to be evaluated.
Carr, Cynthia A.
"Characterization of ARC,"
Journal of the Microelectronic Engineering Conference: Vol. 3
, Article 8.
Available at: http://scholarworks.rit.edu/ritamec/vol3/iss1/8