Experimental analysis via the Perkin Elmer Development Rate Monitor (DRM) has determined that KTI-820 resist, when exposed at 48 mJ/cm2 and developed for 30 sec in KTI-934 developer, gives optimum results. That is, 2 micron line-space pairs have been successfully reproduced with minimal sidewall sloping.
"Anaylsis of KTI-820 Positive Resist Using the Perkin Elmer Development Rate Monitor,"
Journal of the Microelectronic Engineering Conference: Vol. 3
, Article 4.
Available at: http://scholarworks.rit.edu/ritamec/vol3/iss1/4