Contamination during processing in RIT’S cleanroom facility is a leading cause in the failure of fabricated devices and circuits. Detection of these contaminants is possible using an ESTEK WIS-600 surface inspection system. Before and after particle counts were taken using this system when processing wafers in many common RIT procedures. It was found that contamination levels were significant in most areas, and cleaning procedures were useful only to remove large particles.
Shire, Daniel C.
"Contamination in RIT Processing,"
Journal of the Microelectronic Engineering Conference: Vol. 3
, Article 33.
Available at: http://scholarworks.rit.edu/ritamec/vol3/iss1/33