Using a “shadow mask” technique, a single level metal 3-phase CCD shift register was fabricated with electrode separations of 2.5 microns. Testing is pending at this time.
Picano, Paul F.
"Fabrication of a single Level Metal CCD Shift Register,"
Journal of the Microelectronic Engineering Conference: Vol. 3
, Article 30.
Available at: http://scholarworks.rit.edu/ritamec/vol3/iss1/30