The construction of a Quasi—Static C—V measurement tool and proper operation are presented. Gate oxides were analyzed for ion implanted regions. Guidelines for obtaining higher quality Quasi—Static C—V measurements will be presented.
Mason, Randall J.
"Construction of a Quasi-Static C-V Test Station,"
Journal of the Microelectronic Engineering Conference: Vol. 3
, Article 25.
Available at: http://scholarworks.rit.edu/ritamec/vol3/iss1/25