An optimum reversal process utilizing AZ5214-E photoresist has been defined with respect to profile angle along with statistical modeling of critical variables on the resulting resist profile. A novel positive tone lift-off process was also attempted with AZ5214-E with limited success.
Lindstedt, Robert C.
"Image Reversal Optimization and a Positive Tone Lift-Off Process with AZ5214-E Photoresist,"
Journal of the Microelectronic Engineering Conference: Vol. 3
, Article 22.
Available at: http://scholarworks.rit.edu/ritamec/vol3/iss1/22