This project involved the definition of the steps necessary to generate a mask or reticle for any of the three exposure tools (te. GCA lox G-line Stepper, Perkin Elmer Scanning Aligners, and Kasper Contact Aligners) used at RIT. Next a working process for creating chrome masks for the Perkin Elmer Scanners was developed. Using the process outlined in this paper 5 micron line widths can be repeatedly obtained.
Kanen, David P.
"Advanced Mask Making at RIT,"
Journal of the Microelectronic Engineering Conference: Vol. 2
, Article 19.
Available at: http://scholarworks.rit.edu/ritamec/vol2/iss1/19