The effect of TCA tube cleaning and oxidation on mobile ion contamination for the growth of gate oxides was Investigated. It was found that the TCA tube clean had a major effect in reduction of mobile ions, while the TCA gate oxide process employed had a negligible effect.
Fatke, David H.
"Development and Evaluation of Chlorinated Gate Oxides,"
Journal of the Microelectronic Engineering Conference: Vol. 2
, Article 11.
Available at: http://scholarworks.rit.edu/ritamec/vol2/iss1/11