A method for simulating dopant activation at low temperatures is proposed and tested, with a proof of concept showing the expected behavior implemented.
Driscoll, James D.
"Modeling and Simulation of Low Temperature Activation Processes,"
Journal of the Microelectronic Engineering Conference: Vol. 19
, Article 11.
Available at: http://scholarworks.rit.edu/ritamec/vol19/iss1/11