Solar cells were fabricated at the Semiconductor and Microsystems Fabrication Laboratory at Rochester Institute of Technology on two different substrates. Standard polished p-type Si and a substrate consisting of a 15 μm p-type epitaxial Si built on a p+ substrate Si wafer. In addition, on the epitaxial Si both diffusion and ion implantation were used for doping. Using both epitaxial Si and ion implantation created solar cells that outperformed the diffusion and p-type Si solar cells.
"Fabrication and Characterization of Solar Cells on p-type Si and p/p+Epitaxial Si,"
Journal of the Microelectronic Engineering Conference: Vol. 18
, Article 8.
Available at: http://scholarworks.rit.edu/ritamec/vol18/iss1/8