Publication Date
2006
Document Type
Paper
Abstract
Alignment was accomplished as the ultimate goal in the development of an electron beam lithography process. System was based on LEO EVO 50 scanning electron microscope at RIT’s Semiconductor and Microsystems Fabrication Laboratory (SMFL) with external writing control software package NPGS v 9.0.160. Preliminary work included investigation of line- and area-pattern writing in negative tone AZ nLOF 2020 resist diluted 1:2 with PGMEA and pattern transfer into silicon substrate via plasma etch. Manual alignment with ±100 nm translational accuracy across a 100 μm writing field was demonstrated.
Recommended Citation
Jeliazkov, Stoyan J.
(2006)
"Alignment in Electron Beam Lithography,"
Journal of the Microelectronic Engineering Conference: Vol. 16:
Iss.
1, Article 10.
Available at:
https://repository.rit.edu/ritamec/vol16/iss1/10