GMR Spin-Valve test structures have been fabricated in collaboration with Veeco/CVC. Various multi-layer spin-valve structures such as synthetic metal spin-valve, bottom nano oxide layer (BNOL) spin-valve, top nano oxide layer (TNOL) spin-value and surfactant spin-value structures were deposited utilizing Veeco’s UHV Nexus PVD-10 Target Planetary system. The test structures were designed by using Mentor Graphics CAD tool. Photo masks were fabricated by using Perkin Elmer MEBES III electron beam writer. A photolithographic process consisting of etch and lift-off steps has been developed to define the dimensions of the spin valve test structure. The electrical and magnetic properties of sheet film stacks and patterned devices were tested and compared
"Design and Fabrication of Giant Mangnetoresistance (GMR) Spin-Value Structures,"
Journal of the Microelectronic Engineering Conference: Vol. 13
, Article 17.
Available at: http://scholarworks.rit.edu/ritamec/vol13/iss1/17