The necessity of being able to accurately measure sub-micron features in devices fabricated in RIT’s microelectronic manufacturing facility has resulted in the acquisition of a Hitachi S-6780 CD SEM The Hitachi SEM will remove all user error, completely automate the current CD measurement procedure, and yield more accurate results. This project entails learning the operations of this model of SEM and the creation of various instruction manuals to allow this tool to become a commonly used piece of equipment at RIT. Explained will be the different kinds of files and measurement techniques the S-6780 SEM uses. Various experiments were performed and will be discussed proving the reliability and accuracy of this tool with measurement capabilities at RIT down to 0.3 urn.
"Utilization of the Hitachi S-6780 SEM For Critical Dimension Measurement,"
Journal of the Microelectronic Engineering Conference: Vol. 11
, Article 4.
Available at: http://scholarworks.rit.edu/ritamec/vol11/iss1/4