Publication Date
2001
Document Type
Paper
Abstract
In order to confidently reproduce results obtained from experimentation or standard processing, the stability of the involved equipment’s performance must be understood. Therefore, it is important to monitor, on a regular basis, the outputs of an equipment set which are delivering a desired process. In this paper, a qualification test or "qual” will be defined for RIT’s 150mm i-line photolithography process which utilizes a Canon FPA 2000-i1 exposure tool.
Recommended Citation
Perez, Joseph G.
(2001)
"I-Line Resist Process Monitor,"
Journal of the Microelectronic Engineering Conference: Vol. 11:
Iss.
1, Article 2.
Available at:
https://repository.rit.edu/ritamec/vol11/iss1/2